Low energy electron microscopy studies of steps on single crystal thin films of refractory metals

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2473-2477

  Ondrejcek, M ^a   Swiech, W ^a   Yang, G ^a   Flynn, C P ^a  

^a United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATIONS (CRYSTALS); FILM GROWTH; HIGH TEMPERATURE EFFECTS; MOLECULAR BEAM EPITAXY; MOLYBDENUM; NIOBIUM; REFRACTORY MATERIALS; SINGLE CRYSTALS; SURFACE PROPERTIES; TANTALUM; THERMODYNAMIC PROPERTIES; THIN FILMS;

LOW ENERGY ELECTRON MICROSCOPY; STEP-STEP INTERACTIONS;

ELECTRON MICROSCOPY;

EID: 0036883195     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521958     Document Type: Article

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