Plasma assisted deposition of nanocrystalline BCN thin films and property characterization

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2275-2280

  Cao, Z X ^a   Liu, L M ^a   Oechsner, H ^b  

^a INSTITUTE OF PHYSICS   (China)

^b Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; ELECTRON CYCLOTRON RESONANCE; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VICKERS HARDNESS TESTING; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON CARBON NITRIDE; CRYSTALLITES; INFRARED ABSORPTION;

BORON COMPOUNDS;

EID: 0036883164     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1518973     Document Type: Article

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