Lossless layout compression for maskless lithography systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 467-477

  Dai, Vito ^a   Zakhor, Avideh ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; IMAGE PROCESSING; INTEGRATED CIRCUIT MANUFACTURE;

DIRECT WRITE MASKLESS LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033682556     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)