Measurement of bulk etch rate of LR115 detector with atomic force microscopy

Radiation Measurements

Volumn 35, Issue 6, 2002, Pages 571-573

  Ho, J P Y ^a   Yip, C W Y ^a   Koo, V S Y ^a   Nikezic, D ^a   Yu, K N ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Atomic force microscopy (AFM); Bulk etch rate; LR115; Solid state nuclear track detector

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; IONS; MATHEMATICAL MODELS;

SOLID-STATE NUCLEAR TRACK DETECTORS;

RADIATION DETECTORS;

EID: 0036882611     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4487(02)00069-0     Document Type: Article

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