Investigation and simulation of XeF2 isotropic etching of silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1850-1854

  Bahreyni, Behraad ^a   Shafai, C ^a  

^a UNIVERSITY OF MANITOBA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; ETCHING; MASKS; SURFACE ROUGHNESS; TRENCHING;

ISOTROPIC ETCHING;

SILICON WAFERS;

EID: 0036864385     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1506172     Document Type: Article

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