Titanium-containing hydrofluoric acid pretreatment for aluminum chemical vapor deposition

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 142-146

  Sugai, Kazumi ^a   Okabayashi, Hidekazu ^a   Kishida, Shunji ^a   Shinzawa, Tsutomu ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Aluminium; Chemical vapour deposition; Surface morphology; Titanium

Indexed keywords

ADSORPTION; ALUMINUM; CHEMICAL VAPOR DEPOSITION; DRYING; ELECTRIC RESISTANCE; HYDROFLUORIC ACID; MORPHOLOGY; NUCLEATION; SURFACE TREATMENT; SURFACES; TEMPERATURE; TITANIUM;

DEPOSITION TEMPERATURE; ELECTROMIGRATION RESISTANCE; SOLUTION PRETREATMENT;

METALLIC FILMS;

EID: 0030190074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08207-7     Document Type: Article

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