Preparation and electron field emission properties of nano-diamond films

Materials Letters

Volumn 56, Issue 6, 2002, Pages 948-951

  Wang, S G ^a   Zhang, Q ^a   Yoon, S F ^a   Ahn, J ^a   Wang, Q ^a   Yang, D J ^a   Zhou, Q ^a   Huang, Q F ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Electron emitter; Electron field emission; MPCVD; Nano diamond film; Nitrogen; Threshold electric field

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALS; ELECTRIC FIELDS; ELECTRON EMISSION; GRAIN SIZE AND SHAPE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; X RAY DIFFRACTION;

THRESHOLD ELECTRIC FIELDS;

DIAMOND FILMS;

EID: 0036840260     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)00645-6     Document Type: Article

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