Decomposition of SF6 in an RF Plasma Environment

Journal of the Air and Waste Management Association

Volumn 52, Issue 11, 2002, Pages 1274-1280

  Shih, Minliang ^a   Lee, Wen Jhy ^a   Tsai, Cheng Hsien ^a   Tsai, Perng Jy ^a   Chen, Chuh Yung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; ETCHING; EXHAUST GASES; PLASMAS;

POLLUTANTS;

WASTE MANAGEMENT;

ARGON; FLUORINE; OXYGEN; SILICON DIOXIDE; SULFUR DERIVATIVE; SULFUR DIOXIDE; SULFUR HEXAFLUORIDE; SULFUR OXYFLUORIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL REACTION; DECOMPOSITION; EXHAUST GAS; POLLUTANT; PRIORITY JOURNAL; RADIOFREQUENCY; REACTOR; SEMICONDUCTOR; CHEMISTRY; GAS; POLLUTION; RADIOFREQUENCY RADIATION;

ENVIRONMENTAL POLLUTION; GASES; RADIO WAVES; SEMICONDUCTORS; SULFUR HEXAFLUORIDE;

EID: 0036826909     PISSN: 10962247     EISSN: 21622906     Source Type: Journal    
DOI: 10.1080/10473289.2002.10470864     Document Type: Article

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