Metal-arc plasma ion implantation in a straight magnetic filter

IEEE Transactions on Plasma Science

Volumn 30, Issue 5, 2002, Pages 1843-1847

  Ueda, Mário ^a   Dallaqua, Renato Sérgio ^a   Rossi, José Osvaldo ^a   Tan, Ing Hwie ^a   Abramof, Eduardo ^a   Beloto, Antonio Francisco ^a   Del Bosco, Edson ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

Ion implantation; Metal arc; Plasma; Surface material treatment

Indexed keywords

IONIZATION; MAGNETIC FILTERS; PLASMA DENSITY; PLASMAS; SILICON WAFERS; SURFACE TREATMENT; X RAY DIFFRACTION ANALYSIS;

HIGH DENSITY PLASMAS; METAL ARC PLASMA ION IMPLANTATION; METALLIC IONS;

ION IMPLANTATION;

EID: 0036820157     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.805432     Document Type: Article

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