Fabrication of SiO2-humps on silicone rubber using F2 laser

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 10 A, 2002, Pages

  Takao, Hiromitsu ^a   Okoshi, Masayuki ^a   Inoue, Narumi ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

F2 laser; Modification; Silicone; SiO2 hump; Swelling

Indexed keywords

GLASS; IRRADIATION; MICROSTRUCTURE; PHOTONS; RUBBER; SCANNING ELECTRON MICROSCOPY; SILICONES; SOLID STATE LASERS; SURFACE TREATMENT;

SILICA HUMPS;

SILICA;

EID: 0036814184     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1088     Document Type: Article

References (9)

1. P.R. Herman, R.S. Marjoribanks, A. Oettl, K. Chen, I. Konovalov and S. Ness: Appl. Surf. Sci. 154/155 (2000) 577.
2. Y. Ueno, T. Fujii and F. Kannari: Appl. Phys. Lett. 65 (1994) 1370.
3. T. Akane, K. Sugioka, S. Nomura, K. Hammura, K. Obata, N. Aoki, K. Toyoda, Y. Aoyagi and K. Midorikawa: Proc. SPIE 4088 (2000) 70.
4. M. Lapczyna and M. Stoke: Appl. Phys. A 66 (1998) 473.
5. T. Jitsuno, H. Mikata, K. Tokumura, N. Kuzuu, N. Kitamura and Y. Kawaguchi: Proc. SPIE 4088 (2000) 355.
6. P.R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi and J. Yang: Proc. SPIE 2992 (1997) 86.
7. P.R. Herman, K.P. Chen, P. Corkum, A. Naumov, S. Ng and J. Zhang: Proc. SPIE 4088 (2000) 345.
8. M. Okoshi, M. Kuramatsu and N. Inoue: Jpn. J. Appl. Phys. 41 (2002) 1395.
9. M. Okoshi, M. Kuramatsu and N. Inoue: to be published in Appl. Surf. Sci. 8107.