Processing applications with the 157-nm fluorine excimer laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2992, Issue , 1997, Pages 86-95

  Herman, Peter R ^a   Beckley, Keith ^a   Jackson, Brian ^a   Kurosawa, Kou ^b   Moore, David ^a   Yamanishi, Takayuki ^b   Yang, Jianhao ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF MIYAZAKI   (Japan)

Author keywords

Fluorine laser; Laser ablation; Micromachining; Photosensitivity; Pulsed laser deposition

Indexed keywords

EXCIMER LASERS; FILMS; FLUORINE; III-V SEMICONDUCTORS; LASER ABLATION; LIGHT SENSITIVE MATERIALS; MICROMACHINING; OPTICAL FIBERS; PHOTOSENSITIVITY; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTOR LASERS; SILICA;

EXCIMER LASER PROCESSING; HOLOGRAPHIC STRUCTURES; OUTPUT WAVELENGTHS; PHOTOCHEMICAL INTERACTIONS; PHOTOCHEMICAL PROCESSING; PROCESSING APPLICATIONS; SHORT PULSE DURATION; VACUUM ULTRAVIOLETS;

LASER MATERIALS PROCESSING;

EID: 0002951691     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.270086     Document Type: Conference Paper

References (25)

1. see examples in Advanced Laser Processing of Materials-Fundamentals and Applications, Materials Research Society Symposium Proceedings 397, 1996.
2. J. Albert, B. Malo, K. O. Hill, F. Bilodeau, D. C. Johnson, and S. Theriault, Comparison of one-photon effects in the photosensitivity of germanium-doped silica optical fibers exposed to intense ArF excimer laser pulses, Appl. Phys. Lett. 67, pp. 3529-31, 1995.
3. 2 thin films by reactive excimer laser ablation, Appl. Surf. Sci. 54, pp. 180-186, 1992.
4. A. A. Puretzky, D. B. Geohegan, G. E. Jellison Jr., and M. M. McGibbon, Amorphous diamond-like carbon film growth by KrF- and ArF- excimer laser PLD: correlation with plume properties, Mat. Res. Soc. Symp. Proc. 388, pp. 145-150, 1995.
5. 2u) laser, J. Appl. Phys. 73, pp. 5274-5276, 1993.
6. P. R. Herman, B. Chen, D. J. Moore, and M. Canaga-Retnam, Photoablation studies of polymers, quartz, and semiconductors with VUV laser radiation, Mat. Res. Soc. Symp. Proc. 236, pp. 53-58, 1992.
7. Y. Morimoto, T. Igarashi, and T. Okanuma, Vacuum ultraviolet-induced strain in vitreous silica used for xenon lamp bulbs, J. of Non-Crystal Solids 179, pp. 260-275, 1994.
8. K. Sugioka, S. Wada, Y. Ohnuma, A. Nakamura, H. Tashiro, and K. Toyoda, Multiwavelength irradiation effect in fused quartz ablation using vacuum-ultraviolet Raman laser, Appl. Surf. Sci. 96-86, pp. 347-351, 1996.
9. 2 with pulse widths from 7 ns to 150 ns, Appl Phys. Lett. 64, pp. 3071-73, 1994.
10. M. Rothschild, D. J. Ehrlich, and D. C. Shaver, Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica, Appl Phys. Lett. 55, pp. 1276-78, 1989.
11. Y. Kawamura, K. Toyoda, and S. Namba, Effective deep ultraviolet photoetching of polymethylmethacrylate by an excimer laser Appl Phys. Lett. 40, pp. 374-375, 1982;
12. R. R. Krchnavek, G. R. Lalk, and D. H. Hartman, Laser direct writing of channel waveguides using spin-on polymers, J. Appl. Phys. 66, pp. 5156-5160, 1989;
13. + laser, J. Appl Phys. 71, pp. 2030-32, 1992;
14. L. Eldada, M. N. Ruberto, R. Scarmozzino, M. Levy, and R. M. Osgood, Laserfabricated low-loss single-mode waveguiding devices in GaAs, J. of Lightwave Tech. 10, pp. 1610-1616, 1992;
15. A. Mukherjee, B. J. Eapen, and S. K. Baral, Very low loss channel waveguides in polymethylmethacrylate, Appl. Phys. Lett. 65, pp. 3179-81, 1994.
16. M. Kawachi, Recent progress in silica-based planar ligthwave circuits on silicon, IEE Proc. -Optoelectronics 143, pp. 257-262, 1996;
17. Y. P. Li and C. H. Henry, Silica-based optical integrated circuits, ibid. pp. 263-280.
18. P. R. Herman, J. Yang, K. Kurosawa, and T. Yamanishi, Laser machining of single-mode rib waveguides on germanosilicate slabs, to appear in Laser Applications in Microelectronic and Optoelectronic Manufacturing II, SPIE Proc. 2991, 1997.
19. 2 glasses, Opt. Lett. 20, pp. 1184-86, 1995.
20. P. R. Herman and K. Beckley, Photosensitivity in optical fibers with the 157-nm fluorine excimer laser, to appear in Photosensitive Optical Materials and Devices, SPIE Proc. 2998, 1997.
21. D. B. Chrisey, and G. K. Hubler, editors, Pulsed Laser Deposition of Thin Films, John Wiley & Sons, Inc., New York, 1994.
22. 2 film deposition by XeCl laser ablation of fused silica, Appl. Surf. Sci. 86, pp. 128-133, 1995.
23. 2 laser radiation, in Laser Ablation: Mechanisms and Applications-II, AIP Proc. 288, pp. 76-81, 1993;
24. J. D. Moore, Vacuum ultraviolet laser-driven etching of InP using hydrocarbon precursor gases, MASc Thesis, University of Toronto, 1994.
25. 2 laser pulse, in Conf on Lasers and Electro-Optics, OSA Tech. Digest 8, pp. 427-28, 1994.