Low-temperature crystallization of amorphous Si films using AlCl3 vapor

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 315-321

  Ahn, Jin Hyung ^a   Hye Eom, Ji ^a   Hoon Yoon, Kyung ^b   Ahn, Byung Tae ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

AlCl3 vapor; Crystallization; Poly Si thin film

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; LOW TEMPERATURE EFFECTS; POLYSILICON; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING ALUMINUM COMPOUNDS; SURFACE ROUGHNESS;

SOLID-PHASE CRYSTALLIZATIONS;

AMORPHOUS FILMS;

EID: 0036777266     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00090-9     Document Type: Article

References (13)