Sub-nanometer resolution ultrasonic motor for 300 mm wafer lithography precision stage

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 9, 2002, Pages 5858-5863

  Egashira, Yoshiya ^a,f   Kosaka, Kouji ^a   Iwabuchi, Tetsuya ^b   Kosaka, Tetsuya ^c   Baba, Tetsuro ^d   Endo, Taishi ^d   Hashiguchi, Hiroyuki ^a   Harada, Takashi ^a   Nagamoto, Keiichi ^c   Watanabe, Masayuki ^c   Yamakawa, Takahiro ^d   Miyata, Noboru ^a   Moriyama, Shiro ^a   Morizono, Yasuhiro ^b   Nakada, Akira ^a   Kubota, Hiroshi ^b   Ohmi, Tadahiro ^e  

^a KUMAMOTO UNIVERSITY   (Japan)

^b KUMAMOTO UNIVERSITY   (Japan)

^c Tokyo Technology Co Ltd   (Japan)

^d TAIHEIYO CEMENT CORPORATION   (Japan)

^e Nihon Ceratec Co Ltd   (Japan)

^f TOHOKU UNIVERSITY   (Japan)

Author keywords

Electron beam; Nanometer range positioning; Nonresonant ultrasonic motor; Piezoelectric actuator; Precision stage; PZT

Indexed keywords

ACTUATORS; CLOSED LOOP CONTROL SYSTEMS; ELECTRON BEAMS; ERROR ANALYSIS; LSI CIRCUITS; NANOSTRUCTURED MATERIALS; PIEZOELECTRIC DEVICES; ULTRASONIC APPLICATIONS;

PRECISION STAGE;

LITHOGRAPHY;

EID: 0036756838     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5858     Document Type: Article

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