Dielectric properties of fluorine-containing polymethylsiloxane-imide films

High Performance Polymers

Volumn 14, Issue 3, 2002, Pages 271-283

  Wang, Huimin ^a,b   Tao, Xiaoming ^a   Newton, Edward ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b SHANDONG UNIVERSITY   (China)

Author keywords

Dielectric relaxation behavior; Electric conduction and kinetic characteristics; Fluorine containing polysiloxane imide; Ultralow dielectric constant

Indexed keywords

ACTIVATION ENERGY; DIELECTRIC RELAXATION; ELECTRIC CONDUCTIVITY; FLUORINE; PERMITTIVITY; PLASTIC FILMS;

DIPOLAR RELAXATION;

POLYIMIDES;

EID: 0036755703     PISSN: 09540083     EISSN: None     Source Type: Journal    
DOI: 10.1177/095400830201400304     Document Type: Article

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