Mechanism of copper diffusion over the Si(110) surface

Semiconductors

Volumn 36, Issue 9, 2002, Pages 958-961

  Dolbak, A E ^a   Zhachuk, R A ^a   Olshanetsky, B Z ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

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EID: 0036752860     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1507271     Document Type: Article

References (20)

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