Abnormal room-temperature oxidation of silicon in the presence of copper

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1653-1658

  Hinode, Kenji ^a   Takeda, Ken'ichi ^a   Kondo, Seiichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL ATOMIC STRUCTURE; ELECTRON BEAMS; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; IMAGE ANALYSIS; METALLIZING; MORPHOLOGY; OXIDATION; SCANNING ELECTRON MICROSCOPY; SURFACE REACTIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON BEAM EVAPORATION;

SEMICONDUCTING SILICON;

EID: 0036748717     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1497179     Document Type: Article

References (19)

1. K.D. Beyer, U.S. Patent No. 4,944,836 (filed 25 October 1985).
2. B. Luther et al., VMIC, 1993, pp. 15-21.
3. D.A. Ramappaand and W.B. Hendy, J. Electrochem. Soc. 146, 2258 (1999).
4. J.-C. Chiou, H.-I. Wang, and M.-C. Chen, J. Electrochem. Soc. 143, 990 (1996).
5. S.I. Raider, Appl. Phys. Lett. 23, 34 (1973).
6. C.S. Liu and L.J. Chen, J. Appl. Phys. 74, 5501 (1993).
7. C. Cytermann, R. Brener, E. Sacher, B. Pratt, and R. Weil, Appl. Phys. Lett. 52, 191 (1988).
8. J.M.E. Harper, A. Charai, L. Stolt, F.M. d'Heurle, and P.M. Fryer, Appl. Phys. Lett. 56, 2519 (1990).
9. C.S. Liu and L.J. Chen, J. Appl. Phys. 74, 3611 (1993).
10. C.S. Liu and L.J. Chen, Thin Solid Films 262, 187 (1995).
11. J. Li, J.W. Mayer, L.J. Matienzo, and F. Emmi, Mater. Chem. Phys. 32, 390 (1992).
12. T.L. Alford, E.J. Jaquez, N. David Theodire, S.W. Russell, M. Diale, and D. Adams, J. Appl. Phys. 79, 2074 (1996).
13. Y. Kimura, H. Naruoka, M. Kume, T. Katayama, H. Yamamoto, and Y. Mashiko, Proc. SPIE 3510, 169 (1998).
14. Powder Diffraction File, Joint Committee on Powder Diffraction Standards, ICDD, Newtown Square, PA, 1999.
15. L.A. Bruce and H. Jaeger, Philos. Mag. 36, 1331 (1977).
16. Y. Nagai, T. Chiba, Z. Tang, T. Akahane, T. Kanai, M. Hasegawa, M. Takenaka, and E. Kuramoto, Phys. Rev. Lett. (to be published).
17. See, e.g., A.S. Grove, Physics and Technology of Semiconductor Devices (Wiley, New York, 1967).
18. A. Hiraki, Jpn. J. Appl. Phys., Part 1 22, 549 (1983).
19. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami, and K. Suma, Appl. Phys. Lett. 55, 562 (1989).