SCOPUS 정보 검색 플랫폼

Volumn 37, Issue 17, 2002, Pages 3561-3567

Preparation of high yield multi-walled carbon nanotubes by microwave plasma chemical vapor deposition at low temperature

(3) Chen, Mi a Chen, Chieng Ming a Chen, Chia Fu a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH (MATERIALS); LOW TEMPERATURE EFFECTS; MICROSTRUCTURE; MICROWAVES; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY;

FLOW RATE RATIO; MICROSTRUCTURE MORPHOLOGY; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; MULTI-WALLED CARBON NANOTUBES;

CARBON NANOTUBES;

EID: 0036732894 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1016544001173 Document Type: Article

Times cited : (58)

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