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Volumn 17, Issue 9, 2002, Pages 983-992

Characterization of sub-micrometre silicon films (Si-LPCVD) heavily in situ boron-doped and submitted to treatments of dry oxidation

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; GRAIN GROWTH; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036713878     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/17/9/315     Document Type: Article
Times cited : (2)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.