Controlled crystallization of LPCVD amorphous silicon

Thin Solid Films

Volumn 272, Issue 1, 1996, Pages 93-98

  Tompkins, Harland G ^a   Seddon, Ken ^a   Garling, Lisa K ^a   Fejes, Peter ^a  

^a MOTOROLA INC   (United States)

Author keywords

Amorphous materials; Crystallization; Ellipsometry; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; ELLIPSOMETRY; KINETIC THEORY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

DEGREE OF CRYSTALLINITY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY;

AMORPHOUS SILICON;

EID: 0029779514     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06979-8     Document Type: Article

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