Low-pressure plasma sources for etching and deposition

Plasma Sources Science and Technology

Volumn 11, Issue 3 A, 2002, Pages

  Cooke, M J ^a   Hassall, G ^a  

^a OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CHARGE; ELECTRODES; ETCHING; OPTICAL DESIGN; PLASMA DENSITY; PRESSURE EFFECTS; SPECTRUM ANALYSIS; THIN FILMS; TRANSPORT PROPERTIES;

INDUCTION COUPLED PLASMA SOURCE DESIGN; LOW PRESSURE PLASMA SOURCES; PLASMA TRANSPORT SOURCES;

PLASMA SOURCES;

EID: 0036672158     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/11/3A/311     Document Type: Conference Paper

References (18)