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Volumn 17, Issue 7, 2002, Pages 735-739
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Influence of processing parameters on the transport properties of quantum point contacts fabricated with an atomic force microscope
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRIC CONDUCTANCE;
ELECTRON GAS;
ETCHING;
HETEROJUNCTIONS;
LITHOGRAPHY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SURFACES;
THRESHOLD VOLTAGE;
TRANSPORT PROPERTIES;
ATOMIC FORCE MICROSCOPE;
CONDUCTANCE CHARACTERISTICS;
QUANTUM POINT CONTACTS;
TWO DIMENSIONAL ELECTRON GAS;
WET CHEMICAL ETCHING;
QUANTUM ELECTRONICS;
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EID: 0036646008
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/17/7/317 Document Type: Article |
Times cited : (25)
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References (15)
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