High rate of diamond deposition through graphite etching in a hot filament CVD reactor

Diamond and Related Materials

Volumn 11, Issue 7, 2002, Pages 1337-1343

  Shin, Seung Doh ^a   M Hwang, Nong ^a,b   Kim, Doh Yeon ^a  

^a Seoul National University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Diamond; Graphite etching; High deposition rate; Hot filament

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ETCHING; FILM GROWTH; GRAPHITE; HYDROCARBONS; HYDROGEN; METHANE; SILICON; SURFACE ROUGHNESS;

GRAPHITE ETCHING;

DIAMOND FILMS;

DEPOSITION; DIAMOND; ETCHING; FILM; GRAPHITE; THERMAL CONDUCTIVITY;

EID: 0036645103     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00671-9     Document Type: Article

References (30)