Development of 3D focused-ion-beam (FIB) etching methods for fabricating micro- and nanodevices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4283-4286

  Kim, Sang Jae ^a   Yamashita, Tsutomu ^b   Nagao, Masanori ^a   Sato, Mitsunori ^b   Maeda, Hiroshi ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

3D; Focused ion beam (FIB) etching; Micro and nanodevice; Single crystal whisker; Thin film; Tunnel junction

Indexed keywords

BISMUTH COMPOUNDS; CRYSTAL WHISKERS; ELECTRODES; ION BEAMS; NANOTECHNOLOGY; SINGLE CRYSTALS; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TUNNEL JUNCTIONS;

FOCUSED-ION-BEAM (FIB) ETCHING;

ETCHING;

EID: 0036614414     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4283     Document Type: Article

References (12)