Interface roughness in SiGe quantum-cascade structures from x-ray reflectivity studies

Journal of Applied Physics

Volumn 91, Issue 11, 2002, Pages 8974-8978

  Roch, T ^a   Meduna M ^a   Stangl, J ^a   Hesse, A ^a   Lechner, R T ^a   Bauer, G ^a   Dehlinger, G ^b   Diehl, L ^b   Gennser, U ^b   Muller E ^b   Grutzmacher D ^b  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CASCADE STRUCTURES; GE CONTENT; INTERFACE FLUCTUATION; INTERFACE ROUGHNESS; LATERAL CORRELATION; LONG RANGE; LOW TEMPERATURES; QUANTUM CASCADE STRUCTURES; SHORT-RANGE FLUCTUATIONS; SI SUBSTRATES; SI/SIGE; VERTICAL CORRELATION; X RAY REFLECTIVITY;

GERMANIUM; INTERFACES (MATERIALS); SILICON ALLOYS;

X RAYS;

EID: 0036607879     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1473674     Document Type: Article

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