Holographic writing of micro-gratings and nanostructures on amorphous SiO2 by near infrared femtosecond pulses

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 89-97

  Hosono, Hideo ^a,b   Kawamura, Ken Ichi ^a   Matsuishi, Satoru ^b   Hirano, Masahiro ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous SiO2; Femtosecond laser; Gratings; Interference; Nanostructure

Indexed keywords

AMORPHOUS MATERIALS; DIFFRACTION GRATINGS; INFRARED RADIATION; LASER ABLATION; LASER MODE LOCKING; NANOSTRUCTURED MATERIALS; SILICA; SILICON WAFERS; THIN FILMS; ULTRASHORT PULSES;

FEMTOSECOND PULSES; MICRO-GRATINGS;

HOLOGRAPHY;

EID: 0036574493     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00518-9     Document Type: Article

References (27)