Crystallographic and electrical properties of platinum film grown by chemical vapor deposition using (methylcyclopentadienyl)trimethylplatinum

Thin Solid Films

Volumn 410, Issue 1-2, 2002, Pages 200-204

  Hiratani, Masahiko ^a   Nabatame, Toshihide ^a   Matsui, Yuichi ^a   Kimura, Shinichiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

Capacitors; Chemical vapor deposition (CVD); Conductivity; Platinum

Indexed keywords

CAPACITORS; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY; FILM GROWTH; IMPURITIES; LATTICE CONSTANTS; MORPHOLOGY; PLATINUM;

MICRO-GRAINS;

THIN FILMS;

EID: 0036573692     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00221-3     Document Type: Article

References (12)