Enhanced silicon oxidation by a hyperthermal beam obtained from laser evaporation of solid ozone

Journal of the Electrochemical Society

Volumn 149, Issue 5, 2002, Pages

  Nishiguchi, Tetsuya ^a,b   Morikawa, Yoshiki ^a   Kekura, Mitsuru ^a   Miyamoto, Masaharu ^a   Nonaka, Hidehiko ^b   Ichimura, Shingo ^b  

^a MEIDENSHA CORPORATION   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EVAPORATION; GROUND STATE; LASER BEAM EFFECTS; LASER PULSES; OZONE; RATE CONSTANTS; SILICA;

PULSED LASER EVAPORATION; TRANSLATIONAL ENERGIES;

THERMOOXIDATION;

EID: 0036573237     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1464138     Document Type: Article

References (28)