Stimulated etching of Si(100) by Cl2 molecular beams with hyperthermal translational energies

Journal of Applied Physics

Volumn 82, Issue 6, 1997, Pages 3137-3142

  Teraoka, Yuden ^a,b   Nishiyama, Iwao ^a  

^a NEC CORPORATION   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001339111     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366157     Document Type: Article

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