Residual stresses in DLC/Si and Au/Si systems: Application of a stress-relaxation model to the nanoindentation technique

Journal of Materials Research

Volumn 17, Issue 4, 2002, Pages 901-906

  Lee, Yun Hee ^a   Kwon, Dongil ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; GOLD; HARDNESS; INDENTATION; RESIDUAL STRESSES; SILICON; STRESS RELAXATION;

NANOINDENTATION TECHNIQUE;

THIN FILMS;

EID: 0036541132     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0131     Document Type: Article

References (18)