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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 4, 2002, Pages 2249-2251

Effect of oxygen plasma treatment of indium tin oxide for organic light-emitting devices with iodogallium phthalocyanine layer

(5) Hashimoto, Yuichi a,b,c Osato, Yoichi a,b Tanaka, Masato a,b Hamagaki, Manabu a,b Sakakibara, Takeshi a,b

a CANON INC (Japan)

b INST OF PHYS AND CHEMICAL RESEARCH (Japan)

c CHUO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CURRENT DENSITY; ELECTRON DEVICE MANUFACTURE; GROWTH (MATERIALS); HOLE TRAPS; IODINE COMPOUNDS; LIGHT EMITTING DIODES; OXYGEN; PERFORMANCE; PLASMA APPLICATIONS;

DEVICE PERFORMANCE; DRIVING VOLTAGE; INDIUM TIN OXIDE; IODOGALLIUM PHTHALOCYANINE LAYER; MOLECULAR CONFIGURATIONS; OXYGEN PLASMA TREATMENT;

INDIUM COMPOUNDS;

EID: 0036529450 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.2249 Document Type: Article

Times cited : (13)

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