Substrate temperature dependence of phase and orientation of pulsed laser deposited Bi-La-Ti-O thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 3 A, 2002, Pages 1495-1499

  Kim, Chang Hoon ^a   Lee, Jung Kun ^b   Suh, Hee Sang ^a   Yi, Jae Yun ^a   Hong, Kug Sun ^a,c   Hahn, Taek Sang ^b  

^a Seoul National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Case Western Reserve University   (United States)

Author keywords

Bi3.25La0.75Ti3O12(BLT) thin films; Fluorite like phase; Laser ablation

Indexed keywords

ANNEALING; HIGH TEMPERATURE EFFECTS; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; SEMICONDUCTING BISMUTH COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS;

LAYERED STRUCTURES;

THIN FILMS;

EID: 0036508626     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.1495     Document Type: Article

References (32)