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Journal of Magnetism and Magnetic Materials

Volumn 241, Issue 1, 2002, Pages 89-95

High-field sensitive magnetic tunneling junctions fabricated by inductively coupled plasma sputtering

(6) Li, Kebin a Wu, Yihong a,b Qiu, Jinjun a Han, Guchang a Guo, Zaibing a Chong, Towchong a,b

a DATA STORAGE INSTITUTE (Singapore)

b NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

Giant magnetoresistance; Magnetic tunneling junctions; Magnetism; Multiyers

Indexed keywords

ELECTRODES; FERROMAGNETIC MATERIALS; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELDS; MAGNETORESISTANCE; SENSITIVITY ANALYSIS; SPUTTERING; SURFACE ROUGHNESS;

MAGNETIC TUNNELING JUNCTIONS (MTJ);

TUNNEL JUNCTIONS;

EID: 0036504465 PISSN: 03048853 EISSN: None Source Type: Journal
DOI: 10.1016/S0304-8853(01)00935-0 Document Type: Article

Times cited : (7)

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