Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films

Volumn 373, Issue 1-2, 2000, Pages 251-254

  Kinoshita, Haruhisa ^a   Takahashi, Jun ^a   Hando, Takuya ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; HARDNESS; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS;

SUPERMAGNETRON PLASMA CHEMICAL VAPOR DEPOSITION METHODS;

DIAMOND FILMS;

EID: 0034262474     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01091-9     Document Type: Article

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