Thickness distribution of large-area diamondlike carbon films formed by CH4/H2 supermagnetron plasma chemical vapor deposition with application of a stationary magnetic field

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 367-371

  Kinoshita, Haruhisa ^a   Nomura, Shyuji ^a   Honda, Masahiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POWER SUPPLIES TO APPARATUS; ELECTRODES; INTERPOLATION; MAGNETIC FIELDS; PLASMA DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING FILMS; SILICON WAFERS;

DIAMOND LIKE CARBON FILMS; RADIO FREQUENCY PHASE DIFFERENCE; SUPERMAGNETRON PLASMA APPARATUS; THICKNESS DISTRIBUTION;

CARBON;

EID: 0034155682     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582194     Document Type: Article

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