Terahertz imaging of silicon wafers

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1247-1250

  Herrmann, Michael ^a   Tani, Masahiko ^a   Sakai, Kiyomi ^a   Fukasawa, Ryoichi ^b  

^a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY DEPENDENCE; IMPLANTED LAYERS; MODEL-BASED OPC; RELATIVE AMPLITUDE; SILICON SAMPLES; SPATIAL RESOLUTION; TERAHERTZ IMAGING; THIN LAYERS; TIME DOMAIN;

CARRIER CONCENTRATION; SUBSTRATES;

SILICON WAFERS;

EID: 0036469612     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1429772     Document Type: Article

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