Innovative optical alignment technique for CMP wafers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 959-970

  Sugaya, Ayako ^a   Kanaya, Yuho ^a   Nakajima, Shinichi ^a   Nagayama, Tadashi ^a   Shiraishi, Naomasa ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Alignment System; CMP; Micro lithography; Overlay; WIS

Indexed keywords

ALGORITHMS; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; OPTIMIZATION; TRACKING (POSITION);

OPTICAL ALIGNMENT TECHNIQUES;

CHEMICAL MECHANICAL POLISHING;

EID: 0036416482     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474475     Document Type: Conference Paper

References (4)

1. Alexander E. Braun, "CMP Becomes Gentler, More Efficient", Semiconductor International, 13, (2001), p.54.
2. N. Shiraishi et al., "Alignment strategies for planarizing technologies", Proc SPIE, Vol3051, pp836 (1997).
3. M. Born and E. Wolf, Principle of Optics, fifth edition, Pergamon press, Oxford, (1975).
4. S. Nakajima et al., "Improving the Measurement Algorithm for Alignment", Proc SPIE, Vol4344, pp572(2001).