Alignment strategies for planarizing technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 836-845

  Shiraishi, Naomasa ^a   Sugaya, Ayako ^a   Coon, Derek P ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; MICROSCOPES; SENSORS; TECHNOLOGY;

OPTICAL MICROLITHOGRAPHY; PHASE CONTRAST MICROSCOPES; PLANARIZING;

PHOTOLITHOGRAPHY;

EID: 0031365074     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276003     Document Type: Conference Paper

References (5)