Marathon evaluation of optical materials for 157-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 45-51

  Liberman, V ^a   Rothschild, M ^a   Efremow, N N ^a   Palmacci, S T ^a   Sedlacek, J H C ^a   Van Peski, C ^b   Orvek, K ^c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b International SEMATECH ^*  (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BARIUM COMPOUNDS; CALCIUM COMPOUNDS; LENSES; OPTICAL MATERIALS; OPTICAL PROPERTIES; SPECTROPHOTOMETRY; ULTRAVIOLET RADIATION;

ORGANIC PELLICLES;

LITHOGRAPHY;

EID: 0035758772     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435759     Document Type: Article

References (9)

1. International Technology Roadmap for Semiconductors 2000.
2. T.M. Bloomstein, V. Liberman, M. Rothschild, D.E. Hardy, and R.B. Goodman, Proc. SPIE 3676, 342(1999).
3. T.M. Bloomstein, V. Liberman, M. Rothschild, D.E. Hardy, and N.N.Efremow, "UV cleaning of contaminated 157-nm reticles", presented at the SPIE Microlithography 2001 Conference.
4. R. R. Kunz, private communication.
5. V. Liberman, T.M. Bloomstein and M. Rothschild, Proc. SPIE 3998, 480 (2000).
6. V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. K. Bates and K. Orvek, Proc. SPIE 4000, 488 (2000).
7. J. H. Burnett, R. Gupta, and U. Griesmann, Proc. SPIE 4000, 1503 (2000).
8. V. Liberman, R. R. Kunz, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, A. Grenville, A. K. Bates, and C. Van Peski, Proc. SPIE 3334, 480 (1998).
9. R.H. French, J. Gordon, D.J. Jones, M.F. Lemon, R.C. Wheland, E. Zhang, F.C. Zumsteg, K.G. Sharp, and W. Qiu, "Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography, " presented at the SPIE Microlithography 2001 Conference.