Preventing sidelobe printing in applying attenuated phase shift reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 543-552

  Ma, Z Mark ^a   Andersson, Andrew ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

Aberration; Aerial image; Attenuated rim shifter PSM; Coherence; Defocus; Interference; Phase shift mask; Sidelobe

Indexed keywords

ABERRATIONS; COHERENT LIGHT; PHASE SHIFT; PRINTING; PULSE MODULATION;

ABERRATION; AERIAL IMAGE; ATTENUATED RIM SHIFTER PSM; COHERENCE; DEFOCUS; INTERFERENCE; PHASE SHIFT MASK; SIDELOBE;

PHOTOMASKS;

EID: 0001289627     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310783     Document Type: Conference Paper

References (10)

1. B. J. Lin, "The attenuated PSM", Solid State Technology 35, pp. 43-47, 1992.
2. F. Kalk, R. French, H. Alpay, and G. Hughes, "Cr-based attenuated embedded shifter pre-production", Pcoc. SPIE 2332, pp. 299-304, 1994.
3. Patent pending.
4. Strict treatment can be found from the book: J. W. Goodman, " Introduction to Fourier optics", McGraw-Hill Book Company, San Francisco, 1968.
5. M Born and E. Wolf, " Principle of Optics", Pergamon Press, Oxford, 1980.
6. A. S. Marathay, "Elements of Optical Coherence Theory", John Wiley & Sons, New York, 1982.
7. E. Tsujimoto, T Watanabe, Y. Sato, A. Moniwa, Y. Igarashi, and Knakajo, " Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking", SPIE 3096, pp.163-l72, 1997.
8. Reference to: W. J Smith. "Modern optical engineering", McGraw-Hill Book, New York, 1990.
9. M. D. Levenson, "wavefront engineering from 500 nm to 100 nm CD", SPIE 3051, pp. 2-13, 1997.
10. C. J. Progler, TI internal publication.