Manufacturing considerations for MEEF minimization and process window optimization for 180 nm contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4404, Issue , 2001, Pages 170-179

  Kang, D ^a   Robertson, S ^a   Reilly, M ^a   Pavelchek, E ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

Contact holes; Masking bias; MEEF; Process window; Simulation

Indexed keywords

COMPUTER SIMULATION; OPTIMIZATION; PARAMETER ESTIMATION; PHASE SHIFT;

MASK ERROR ENHANCEMENT FACTOR (MEEF);

MASKS;

EID: 0034845989     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425204     Document Type: Conference Paper

References (2)

1. MEEF in theory and practice
2. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes