CrOxFy as a material for attenuated phase-shift masks in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 682-687

  Nakazawa, Keisuke ^a   Matsuo, Takahiro ^a   Onodera, Toshio ^a   Morimoto, Hiroaki ^a   Mohri, Hiroshi ^a   Hatsuta, Chiaki ^a   Hayashi, Naoya ^a  

^a NeTech Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; EXCIMER LASERS; INTERFACES (MATERIALS); LITHOGRAPHY; PHASE SHIFT; PHOTORESISTS;

ATTENUATED PHASE SHIFT MASKS; DEPTH OF FOCUS; LASER IRRADIATION;

MASKS;

EID: 0033666587     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392100     Document Type: Conference Paper

References (7)