Optical superlattices as phase-shift masks for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3790, Issue , 1999, Pages 23-35

  Carcia, P F ^a   French, R H ^a   Reynolds, G ^a   Hughes, G ^a   Torardi, C C ^a   Reilly, M H ^a   Lemon, M ^a   Miao, C R ^a   Jones, D J ^a   Wilson, L ^a   Dieu, L ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DIFFRACTION GRATINGS; LIGHT ABSORPTION; LIGHT INTERFERENCE; LITHOGRAPHY; MASKS; NETWORKS (CIRCUITS); OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; TITANIUM NITRIDE;

OPTICAL SUPERLATTICES; PHASE SHIFT MASKS;

SEMICONDUCTOR SUPERLATTICES;

EID: 0033363157     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351257     Document Type: Conference Paper

References (17)