High repetition rate fluorine laser for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (II), Issue , 2000, Pages 1560-1567

  Fujimoto, Junichi ^a   Nagai, Shinji ^a   Shio, Koji ^a   Iwata, Yasuaki ^a   Takehisa, Kiwamu ^a   Nishisaka, Toshihiro ^a   Wakabayashi, Osamu ^a   Mizoguchi, Hakaru ^a  

^a KOMATSU LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GAS LASERS; LASER PULSES; LIGHT TRANSMISSION; OPTICAL COATINGS; OPTICAL MATERIALS; OPTICAL RESOLVING POWER; OSCILLATIONS; PHOTOIONIZATION; PRISMS; REFRACTIVE INDEX; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROMETERS;

FULL WIDTH AT HALF MAXIMUM (FWHM); REFRACTIVE PROJECTION OPTICS; SOLID STATE PULSE POWER MODULES; ULTRANARROW FLUORINE MOLECULAR LASERS; VACCUM ULTRAVIOLET (VUV) SPECTROMETERS;

PHOTOLITHOGRAPHY;

EID: 0033713545     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388997     Document Type: Conference Paper

References (8)