Plasma stream homogeneity in metal plasma immersion ion implantation and deposition

International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

Volumn , Issue , 2002, Pages 455-458

  Mandl S ^a   Rauschenbach, B ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; CATHODES; ELECTRIC POTENTIAL; ELECTRODES; ION IMPLANTATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SHEATHS; SUBSTRATES; TITANIUM NITRIDE; TITANIUM OXIDES; ZINC OXIDE;

METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; PLASMA STREAM HOMOGENEITY;

ELECTRIC ARCS;

EID: 0036396666     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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