SCOPUS 정보 검색 플랫폼

Proceedings of the American Control Conference

Volumn 3, Issue , 2002, Pages 2180-2185

In-situ process control for semiconductor manufacturing

(3) Taylor, James H a Whidden, Thomas K a Ziaozhong, Zhao a

a UNIVERSITY OF NEW BRUNSWICK (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FEEDBACK CONTROL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEATION; REACTION KINETICS; REAL TIME SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; ULSI CIRCUITS;

CHEMICAL KINETIC RELATIONSHIP; IN-SITU PROCESS CONTROL; REAL TIME FEEDBACK CONTROL;

PROCESS CONTROL;

EID: 0036350756 PISSN: 07431619 EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/acc.2002.1023960 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.