Low-pressure chemical vapor deposition of polycrystalline silicon: Analysis of nonuniform growth in an industrial-scale reactor

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3213-3221

  Weerts, W L M ^a,b   De Croon, M H J M ^a   Marin, G B ^a,c  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; MASS TRANSFER; MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; REACTION KINETICS;

DISILANE; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; ONE DIMENSIONAL; POLYCRYSTALLINE SILICON; SILYLENE; THIELE MODULUS;

SILICON WAFERS;

EID: 0031234911     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837986     Document Type: Article

References (31)

1. K. F. Jensen and D. B. Graves, This Journal, 130, 1950 (1983).
2. K. F. Roenigk and K. F. Jensen, ibid., 132, 448 (1985).
3. K. F. Roenigk and K. F. Jensen, ibid., 134, 1777 (1987).
4. S. Middleman and A. Yeckel, ibid., 133, 1951 (1986).
5. T. E. Wilke, K. A. Turner, and C. G. Takoudis, Chem. Eng. Sci., 41, 643 (1986).
6. M. G. Joshi, This Journal, 134, 3118 (1987).
7. K. F. Roenigk, Ph.D. Thesis, University of Minnesota, Minneapolis, MN (1987).
8. A. Yeckel and S. Middleman, This Journal, 134, 1275 (1987).
9. C. Vinante, P. Duverneuil, and J. P. Couderc, in Proceedings of the 7th European Conference on CVD, M. Ducarroir, C. Bernard, and L. Vandenbulcke, Editors, C5-35, Les editions de physique, Les Celis Cedex, France (1989).
10. A. Yeckel, S. Middleman, and A. K. Hochberg, This Journal, 136, 2038 (1989).
11. Ch. Hopfmann, Ch. Werner, and J. I. Ulacia F., Appl. Surf. Sci., 52, 169 (1991).
12. T. A. Badgwell, T. F. Edgar, and I. Trachtenberg, This Journal, 139, 524 (1992).
13. T. A. Badgwell, T. F. Edgar, and I. Trachtenberg, AIChE J., 38, 926 (1992).
14. P. Duverneuil and J.-P. Couderc, This Journal, 139, 296 (1992).
15. C. Azzaro, P. Duverneuil, and J.-P. Couderc, This Journal, 139, 305 (1992).
16. C. Azzaro, P. Duverneuil, and J.-P. Couderc, Int. Chem. Eng., 34, 59 (1994).
17. K. J. Kuijlaars, C. R. Kleijn, and H. E. A. van den Akker, Chem. Eng. J., 57, 127 (1995).
18. W. L. M. Weerts, M. H. J. M. de Croon, and G. B. Marin, Chem. Eng. Sci., 51, 2109 (1996).
19. W. L. M. Weerts, M. H. J. M. de Croon, and G. B. Marin, ibid., 51, 2583 (1996).
20. W. L. M. Weerts, M. H. J. M. de Croon, and G. B. Marin, This Journal, submitted.
21. R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena, John Wiley & Sons, New York (1967).
22. J. O. Hirschfelder, C. F. Curtiss, and R. B. Bird, Kinetic Theory of Gases and Liquids, John Wiley & Sons, New York (1967).
23. B. A. Finlayson, The Method of Weighted Residuals and Variational Principles, Academic Press, New York (1972).
24. NAG, Fortran Library Manual, Mark 15, NAG, Ltd., Wilkinson House, Oxford (1991).
25. W. L. M. Weerts, Ph.D. Thesis, Eindhoven University of Technology, Eindhoven, The Netherlands (1995).
26. W. L. M. Weerts, M. H. J. M. de Croon, and G. B. Marin, Surf. Sci., 367, 321 (1996).
27. P. J. Robinson and K. A. Holbrook, Unimolecular Reactions, John Wiley & Sons, New York (1972).
28. M. E. Coltrin, R. J. Kee, and J. A. Miller, This Journal, 133, 1206 (1986).
29. M. E. Coltrin, R. J. Kee, and G. H. Evans, ibid., 136, 819 (1989).
30. G. F. Froment and K. B. Bischoff, Chemical Reactor Analysis and Design, John Wiley & Sons, New York (1990).
31. M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions, Dover Publications, Inc., New York (1970).