SCOPUS 정보 검색 플랫폼

Volumn 17, Issue 1, 2002, Pages 167-171

Analysis of the reservoir length and its effect on electromigration lifetime

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTROMIGRATION; METALLIZING; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY;

METAL CONDUCTORS;

ELECTRIC CONDUCTORS;

EID: 0036262494 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2002.0025 Document Type: Article

Times cited : (10)

References (13)

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- Hu, C.-K.¹ Rosenberg, R.² Tu, K.N.³

2
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- Stress-Induced Phenomena in Metallization, edited by P. Ho, C.Y. Li, and P. Totta (Am. Inst. Phys., New York)
- (1994) Proc. 2nd Int. Workshop , pp. 165
- Rathore, H.S.¹ Filippi, R.G.² Estabil, R.A.³ Wachnik, J.J.⁴ Kwok, T.⁵

6
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- Blech, I.A.¹ Meieran, E.S.²

7
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- Blech, I.A.¹ Herring, C.²

10
- 85008504503
- (1995) J. Appl. Phys. , vol.78 , Issue.6 , pp. 3759
- Filippi, R.G.¹ Biery, G.A.² Wachnik, R.A.³

12
- 0030378525
- Materials Reliability in Microelectronics VI, edited by W.F. Filter, J.J. Clement, A.S. Oates, R. Rosenberg, and P.M. Lenahan (Pittsburgh, PA)
- (1996) Mater. Res. Soc. Symp. Proc. , vol.428 , pp. 81
- Gall, M.¹ Jawarani, D.² Kawasaki, H.³

13
- 0030400293
- Materials Reliability in Microelectronics VI, edited by W.F. Filter, J.J. Clement, A.S. Oates, R. Rosenberg, and P.M. Lenahan (Pittsburgh, PA)
- (1996) Mater. Res. Symp. Proc. , vol.428 , pp. 87
- Bui, N.D.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.