Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2002, Pages 168-171

  Futai, Nobuyuki ^a   Matsumoto, Kiyoshi ^a   Shimoyama, Isao ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COATING TECHNIQUES; CRYSTAL STRUCTURE; DIELECTRIC LOSSES; DRYING; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; MICROELECTROMECHANICAL DEVICES; PERMITTIVITY; SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CHEMICAL COMPATIBILITY; CRYSTALLINITY; FERROELECTRIC PROPERTIES; HIGH ASPECT RATIO LEAD ZIRCONIUM TITANATE; PLATINIZED SILICON SUBSTRATE;

THICK FILMS;

EID: 0036197822     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

1. PZT thin films for microsensors and actuators: Where do we stand?
2. Fabrication and characterization of a PZT actuated micromirror with two-axis rotational motion for free space optics
3. Micromachined piezoelectric force sensors based on PZT thin films
4. Selective area PZT-preparation by sol-gel method
5. Batch fabrication of stacked piezoelectric microactuators by using silicon mold process
6. Planer fabrication of multilayer piezoelectric actuator by groove cutting and electroplating
7. Periodic arrays of transducers built using sand blasting and ultrasound micromachining techniques for the fabrication of piezocomposite materials
8. 3 thin films by sol gel processing: Electrical and electro-optic properties
9. Processing of multilayer PZT coatings for device purposes
10. A study of the effects of process variables on the properties of PZT films produced by a single-layer sol-gel technique