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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 11, 2002, Pages 6581-6588

Computer simulation study on incident fluence dependence of ion reflection and sputtering processes from layered and mixed materials

(2) Kawakami, Retsuo a Ohya, Kaoru a

a UNIVERSITY OF TOKUSHIMA (Japan)

Author keywords

Depth profile distribution; Fluence dependence; Layered material; Mixed material; Reflection; Sputtering; Target mass difference

Indexed keywords

COMPUTER SIMULATION; ELECTRON EMISSION; ION BOMBARDMENT; IONS; MATHEMATICAL MODELS; MONTE CARLO METHODS; REFLECTION; SPUTTERING; THICKNESS MEASUREMENT;

DEPTH PROFILE DISTRIBUTION; INCIDENT FLUENCE DEPENDENCE; ION REFLECTION; LAYERED MATERIALS; MIXED MATERIALS; PLASMA FACING MATERIALS; REFLECTIVE SCATTERING COLLISIONS; TARGET MASS DIFFERENCE;

DEUTERIUM;

EID: 0036149585 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.6581 Document Type: Article

Times cited : (10)

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