Preparation of amorphous Si1xCx (0≤x≤1) films by alternate deposition of Si and C thin layers using a dual magnetron sputtering source

Surface and Coatings Technology

Volumn 149, Issue 1, 2002, Pages 76-81

  Kikuchi, Naoto ^a   Kusano, Eiji ^a   Tanaka, Tatsuya ^a   Kinbara, Akira ^a   Nanto, Hidehito ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Alternate sputtering; Internal stress; Silicon carbide; X ray photoelectron spectroscopy

Indexed keywords

CATHODES; GLASS; INDENTATION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DUAL-CATHODE SPUTTERING MACHINES;

AMORPHOUS FILMS;

CARBON; INORGANIC COATING; MECHANICAL PROPERTY; MICROSTRUCTURE; OPTICAL FEATURE; SILICON; SILICON CARBIDE; SPUTTERING;

EID: 0036149369     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01415-3     Document Type: Article

References (28)